新型高分辨率三維顯示器件與系統的基礎研究年度報告

摘 要：波前重建（全息）是新型高分辨率動態三維顯示技術的一種實現方式。空間帶寬積是制約三維波前重建圖像的視角范圍、圖像清晰度和尺寸等感知參數的重要物理因素。三維顯示器件空間帶寬積的擴展主要依賴像素尺度的微型化和顯示屏幕的大型化。針對波前重建空間帶寬積的擴展，在電-光調制器件方面，研究全相位調制LCoS器件像素微型化的新方法，通過分析液晶分子預傾角、像素單元介質薄膜、有序納米結構對像素單元空間場強的影響，優化像素單元電場分布，為克服像素微型化帶來的尺度效應提供理論依據。在像素單元CMOS電路方面，分析像素單元存儲電容和負載電容的尺度效應及關聯性。揭示硅基液晶LCoS等效電容尺度極限效應的物理機理。研究高遷移率非晶氧化物TFT材料，探索制備微米尺度像素陣列的新方法；通過超厚電極層等新工藝和銅合金等新材料的研究，為大尺寸顯示器件的制備提供技術支撐。提出大尺寸、高效TFT陣列雙邊驅動新方法，解決電-光調制器件驅動提升的難題，突破微型化像素低壓驅動的關鍵技術。在光-光調制器件方面，建立全息像元的空間帶寬積理論模型，通過針對光折變材料的動力學機制開展研究，突破全息像元的角度、波長、偏振與相位復用關鍵技術，在光折變材料中實現多維復用記錄和波前重建三維顯示。基于以上的研究目標及內容，該年度的完成情況如下：（1）完成了ECB、VA兩種液晶排列方式下的相位和振幅調制特性的研究；建立了雙縫干涉法相位測試平臺，掌握相位調制特性測試方法；（2）采用comsol和TechWiz軟件建立了微型化液晶像素單元理論模型，實現液晶動態響應過程的模擬仿真；針對微型化像素，研究了有序納米結構對空間電場分布的影響和優化；（3）獲得摻W元素對IZO結構和特性影響的基本規律，獲得銅合金電極薄膜制備、測試工藝；制備了新型非晶摻鎢氧化銦（a-IWO）溝道層薄膜及其TFT，比較了Ti，Cr，Ta，Mo4種金屬薄膜作銅電極阻擋層的工藝可行性；獲得了Ag、Cu、Ta等電極薄膜圖形化工藝及相應AOS TFT特性的制備和優化方法；（4）研究全息像元的波前寫入與重建機理，建立光-光調制器件從光信號輸入、光折變記錄到光波前再現整個系統的空間帶寬積計算模型。完成了對金納米顆粒與光致聚合物材料雙向擴散情況下體全息光動力學計算方法的初步研究。初步研究了利用全息復用方法制備高分辨率、高空間帶寬積光-光調制器件的理論模型。

關鍵詞：三維顯示 波前重建 空間帶寬積

Abstract：Wave front reconstruction （holography） is one of the techniques which can display high resolution， real-time 3D information. Space-bandwidth product is the key parameter for viewing angle， image sharpness and reconstruction size. The extension of space-bandwidth product relays on miniaturization of pixels and enlargement of display screens. For extension of space-bandwidth product， we research on two types of devices， electro-optical modulator and optical-optical modulator. For the former， research is on phase-only LCoS， it is expected to provide basic theories of reducing the size effect accompany with miniaturization of pixels by optimization of the influences of liquid crystal pre-tilt angle， dielectric membrane， and aligned nano-structure on electrical field of pixel cells. For CMOS circuits， the size effect and connections between storage capacitance and load capacitance is analyzed. The mechanism of equivalent capacitance size limitation effect of LCoS is revealed. Amorphous oxide TFT with high mobility ratio is researched to explore new method to fabricate micron pixel array. Technical support for fabrication of large size display device is provided by research on new technology of ultra-thick electrode layer and new material like copper alloy. It is expected to propose large size and high efficient TFT array double-side driving scheme， solve the driving promotion problem of electro-optical modulator and master the key technology of low voltage driving of miniaturization of pixels. For the latter， theoretical model of hogel space-width product is built. Based on research on dynamic mechanism of photorefractive material， it is expected to make breakthrough on key techniques on multiplexing of angle， wavelength， polarization and phase. So that multiplex recording can be used for photorefractive material for 3D wavefront reconstruction. Based on the research goals and contents above， the work we have completed is as following：（1）Characterization of phase and amplitude modulation of liquid crystal in ECB and VA mode is completed.（2）The theoretical model of miniaturization of pixel cells is built by using comsol and TechWiz software， with which the dynamic response of liquid crystal can be simulated.（3）Fabrication of new type of a-IWO channel layer membrane and TFT is done.（4）The write and reconstruct mechanism of hologel wavefront is studied.

Key Words：Three dimensional display； Wavefront reconstruction； Space-width product

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